離子束拋光系統(tǒng)
儀器簡介：
ATC 1800-IM 型 |
The system shown above is equipped with a gridded ion source positioned for uniform milling of a 200mm diameter substrate. System features a 1200 l/s turbopump, load-lock with 6-position cassette, and substrate holder with backside gas cooling and rotation. Etch rate is 320 A/min of SiO2 with +/- 2% uniformity. |
離子束拋光系統(tǒng)
ATC ORION-IM 型 |
The system shown above is equipped with an ICP RF plasma source with ion energies up to 300 eV for low energy milling of substrates up to 150mm in diameter. System also includes a 700 l/s turbopump and substrate holder with simultaneous water cooling, rotation, and 0-80 degree tilting capability. |
應(yīng)用：自旋閥 /AMR/ GMR
磁隧道結(jié)
介電界面涂層
Rugate Filters
High-k 材料
形狀記憶合金
光電材料
超導(dǎo)材料
單一結(jié)晶GaN
主要特點(diǎn)：
高效高產(chǎn)量，低能量等離子體源
6 x 4" 偏置靶材旋轉(zhuǎn)架
獨(dú)立偏置靶材，專業(yè)用于控制沉積合金復(fù)合材料
100mm 直徑樣品表面處理
<3%>襯底樣品表面等離子體清洗，刻蝕氧化，氮化
水冷，旋轉(zhuǎn)，磁化，擋板樣品臺，加熱至 600 C
單片樣品傳輸臺（load lock stage）
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