離子束拋光系統
儀器簡介：
ATC 1800-IM 型 |
The system shown above is equipped with a gridded ion source positioned for uniform milling of a 200mm diameter substrate. System features a 1200 l/s turbopump, load-lock with 6-position cassette, and substrate holder with backside gas cooling and rotation. Etch rate is 320 A/min of SiO2 with +/- 2% uniformity. |
離子束拋光系統
ATC ORION-IM 型 |
The system shown above is equipped with an ICP RF plasma source with ion energies up to 300 eV for low energy milling of substrates up to 150mm in diameter. System also includes a 700 l/s turbopump and substrate holder with simultaneous water cooling, rotation, and 0-80 degree tilting capability. |
應用：自旋閥 /AMR/ GMR
磁隧道結
介電界面涂層
Rugate Filters
High-k 材料
形狀記憶合金
光電材料
超導材料
單一結晶GaN
主要特點：
高效高產量，低能量等離子體源
6 x 4" 偏置靶材旋轉架
獨立偏置靶材，專業用于控制沉積合金復合材料
100mm 直徑樣品表面處理
<3%>襯底樣品表面等離子體清洗，刻蝕氧化，氮化
水冷，旋轉，磁化，擋板樣品臺，加熱至 600 C
單片樣品傳輸臺（load lock stage）
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